VUV absorption spectroscopy to assist plasma engineering of Graphene – VIAGRA

This project aims to develop and utilize sophisticated plasma and surface diagnostics to acquire the fundamental knowledge required for the development of robust plasma processes for cleaning, doping, and patterning graphene, as well as for reducing and doping graphene oxide to produce rGO. In particular, we propose to use VUV absorption spectroscopy with a 1 m focal length monochromator (which is quite unique in France) to measure the absolute densities of H, O, and N atoms, as well as NHx radicals and O2* metastable molecules in the microwave plasmas in H2, N2, NH3, and O2 used. In parallel, we suggest constructing an original substrate holder that will allow for precise control of ion energy within the 0-20 eV range, i.e energies required for modifying graphene/rGO without damage. XPS and Raman spectroscopies will be used in parallel to characterize the impact of the plasma on graphene. The targeted applications are significant for emerging technologies, and the methodology developed during the project could be easily be applied to other promising 2D materials in the future. This project brings together the expertise of three groups specializing in plasma science and technology. The project benefits from expertise in IC circuit fabrication, plasma-surface interactions in nuclear fusion (ITER), and fundamental studies of the upper atmosphere. Conversely, since the same plasmas are used, these diverse research areas will also benefit from our project, as the VUV spectroscopy technique employed here will enable complementary experiments spanning a three-year period, rather than being limited to time- constrained campaigns.