DS0710 - Sciences et technologies des composants nanoélectroniques et nanophotoniques

METAL OXO-CLUSTERS AS VERSATILE BUILDING BLOCKS FOR LOW-TEMPERATURE PREPARATION OF SEMI-CONDUCTIVE AND CONDUCTIVE DIRECT WRITE MICRO-NANO PATTERNING – PHOTOMOC

Submission summary

We propose in this project to develop a negative tone photoresist based on a versatile metal-oxo clusters (MOC) plateform for direct-write micro and nanopatterns by DUV lithography at room temperature. By mixing MOC with different compositions, the electrical properties of the final materials will be tuned from insulating to semi-conducting with adjustable parameters.
The MOC will thus be the building block of the material allowing :
- photopatterning
- low temperature assisted by DUV irradiation curing leading to metal oxyde
- semi-conductor properties for final properties

We aim to address both fundamental and applied objectives through this project.
At fundamental point of view, deeper understanding are needed to
1/ fully describe the synthesized metal-oxo clusters,
2/ understand the photoinduced material preparation, including the use of light for crosslinking the material and mineralize it at low temperature,
3/ build relationships between final properties (especially the electrical properties) and multiscale structure,
4/ extend the range of electrical properties, from insulating to semi-conducting materials, with adjustable parameters.

Simple devices will be produced for validating the electrical properties of the material and demonstrate the possibility to fabricate operating devices by a simple low-temperature process. The key issue, reliability, of MOC-based transistor will also be investigated when tuning the MOC materials. Using this new material, direct-write oxide transistor on flexible substrate will be enable and will constitute one of main targets of the project.

This project will be conducted by 2 partners having a strong interaction since more than 5 years. Dr Olivier Soppera at IS2M (CNRS UMR 7361), in France, and Prof Hsiao-Wen Zan at NCTU, in Taiwan had developed complementary research activities in this field. The PHOTOMOC project will be a unique opportunity to shear this expertise and boost up this research. Significant advances in fundamental research with applications in microelectronics, sensors or displays are expected from this work.

Project coordination

Olivier SOPPERA (Institut de Science des Matériaux de Mulhouse)

The author of this summary is the project coordinator, who is responsible for the content of this summary. The ANR declines any responsibility as for its contents.

Partner

IS2M Institut de Science des Matériaux de Mulhouse
NCTU National Chiao Tung University

Help of the ANR 265,200 euros
Beginning and duration of the scientific project: September 2014 - 36 Months

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