Cimap Common Laboratory with Orsay Physics – CiCLOp

Focused beams of charged particles are essential tools for developing, modifying, analyzing, understanding and validating new concepts in nanosciences and nanotechnologies. Their uses cover a wide range of applications, controlled deposition and etching at the nanoscale, localized implantation and doping, controlled structural modifications, secondary emission imaging (electrons, ions, atoms, aggregates, molecules, photons). The vast majority of actors involved in nanotechnologies, both research laboratories and industries, are users of this technology. The needs in terms of performance and constraints can be summarized mainly by (i) the smallest possible beam sizes (< 10 nm), (ii) target intensities ranging from a single particle to a few microamperes, (iii) types and natures of particles, from the single electron to aggregates of several thousand atoms, (iv) energy ranges from eV to several hundred keV.
Among these available tools, Focused Ion Beam (FIB) beams are widely used in the field of microelectronics for quality control or failure analysis during prototyping or mass production of components such as microprocessors. Thus, the market for dual beam FIB machines (equipped with a scanning electron microscope) for semiconductor companies represents a marketing of about 250 machines/year worldwide. This fleet is 95% equipped with gallium source FIB over the energy range of 3 to 30 keV. As the fineness of the semiconductor etchings is constantly evolving (< 7 nm), gallium FIBs now have limitations in use (pollution and amorphization problems). It has therefore become necessary to have non-contaminating FIBs that do not change the structure of the samples significantly. Therefore, current efforts are focused on the use of projectile ions of higher mass from rare gases (e. g. xenon) and energy below keV.
The CiCLOp Joint Laboratory (CIMAP Common Laboratory with Orsay Physics), bringing together the Centre de Recherche sur les Ions, les Matériaux et la Photonique (CIMAP - CEA, CNRS, ENSICAEN et Université de Caen Normandie, UMR 6252) in Caen (14), the project leader and the ETI Orsay Physics-Tescan Orsay Holding in Fuveau (13), proposes to meet these expectations. It will rely on the research and development of original and innovative technological solutions, resulting from work and results recently acquired by each of the partners, to develop a new source of low energy ions. This technological approach will have to be based on scientific breakthroughs, which is why a scientific programme combining simulations and experiments will be deployed. The following studies are necessary: changes in the structural and physical properties of materials subjected to very intense beams, collective effects on abrasion mechanisms, stability of implanted charges and consequences on electrostatic optics generated by these charges. For each stage of the program, the results will be validated by demonstrators and valorized by technology transfers to Orsay Physics in order to lead to intermediate commercial products or devices to be integrated directly into existing systems. The herewith initial program will permit the CiCLOp joint laboratory to continue well beyond the LabCom's three-year term.
In addition to the market for focused ion beam systems (FIB), well known internationally by Orsay Physics, the CiCLOP research and innovation program will address new markets such as those related to quantumtronics and future electronics. Orsay Physics will thus be able to expand its market to many application areas in France and abroad.